NITRIC OXIDE LEVELS AND STRESS IN PATIENTS WITH LICHEN PLANUS : A COMPARATIVE STUDY

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Sanjay Sakarwal

Abstract

Background: Although psychosomatic aspects are linked to dermatological illnesses, their significance in oral lichen planus (OLP) is still up for debate. The objective is to assess salivary NO levels, psychosocial stresses, and their relationships to the etiology of OLP. 
Materials and Methods: Two groups were included in the study: Group II included the control group (n=35) and Group I included the individuals with OLP group (n=35). Stress levels were assessed using the DASS Scale and Griess Reagent on the patients' saliva, respectively. 
Results: It was determined that the difference in the NO level averages was highly significant (P 0.05). The optical density (OD) readings and stress level were found to be extremely significant when compared between groups. 
Conclusion: Stress and salivary NO have a key role in the etiology of OLP.
Key words: Lichen planus, stress, and depression.
 

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How to Cite
Sakarwal, S. (2017). NITRIC OXIDE LEVELS AND STRESS IN PATIENTS WITH LICHEN PLANUS : A COMPARATIVE STUDY. International Journal of Pharmaceutical and Biological Science Archive, 5(06). Retrieved from http://ijpba.in/index.php/ijpba/article/view/396
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